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Physics: EFFECT OF INSULATOR THICKNESS ON THE BARRIER HEIGHT OF THE THIN FILM MIS STRUCTURE

 

EFFECT OF INSULATOR THICKNESS ON THE BARRIER HEIGHT OF THE THIN FILM MIS STRUCTURE

S. A . Hussien, M. N. Makadsi, W. N. Raja

Department of Physics-College Of Science University Of Baghdad Received 27/2/2000 Accepted 22/10/2000

ABSTRACT:

Metal-semiconductor and metal-insulator-semiconductor thin films have been prepared using thermal evaporation technique The value of the barrier height(Φbn )which was calculated using experimental (I-V )measurements and activation energy method showed that (Φbn) increase with increasing insulator thickness.


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