A STUDY AND COMPARSION OF HARDNESS FOR THIN ALUMINUM, SELENIUM, INDIUM TIN OXIDE FILMS
S.K.J.Al-Ani, R.M.S.A l-Haddad and Th.K.AI-Ani Department of Physics . College of Science. University of Baghdad .
Baghdad . Jadriya . Iraq . e.mail: salani'rt uruklink.net
In this paper Al. Se. and ITO thin films have been deposited by thermal evaporation in high vacuum 10-6 torr onto glass and metal substrates held at room temperature .
Annealing process for these films at different temperatures has carried out. The nardness of these mms were measured . The effect of annealing temperature and films thicknesses on the hardness has been studied . It is found that the hardness increased with the increasing of annealing temperature in the range (473-573)K. and decreased with film thicknesses.